Comparison of properties of multilayer film sputtered on glass and polypropylene substrates with angular DC magnetron Co-sputtering system

Complex multilayer film structures were fabricated through a custom-built angular DC magnetron co-sputtering system. In this system, separate Cu, Al, and brass (Cu + Zn) targets were mounted on three magnetron guns, working in conjunction with a rotating substrate. This study aimed to compare the properties of films with intricate structures, which were sputtered onto glass slides and polypropylene substrates. The sputtering process was optimized using a Box-Behnken design, considering three variable operating conditions: substrate rotation speed, sputtering time, and sputtering voltage. The Analysis of Variance (ANOVA) results for film thickness and roughness, sputtered with three different materials onto glass slides and polypropylene (PP) substrates, indicated that all three independent variables significantly influenced the optimum response, with P-values less than 0.05 (

Automated summary

Complex multilayer film structures were fabricated using an angular DC magnetron co-sputtering system, and the optimization of the sputtering process was conducted. The results showed that the thickness and roughness of the sputtered films were significantly influenced by the sputtering time, substrate rotation speed, and sputtering voltage.