Elastoplastic contact model of pitch-based rough surface and its polishing characteristics

Fused silica glass is widely used in optical systems, including astronomical telescopes, laser systems, optical communications, and the semiconductor industry. At the same time, the surface quality of the fused silica directly determines the performance and precision of the system. In order to analyze the microscopic surface interaction based on the basis of tribology, a roughness contact model of pitch and fused silica glass surfaces was established. Analyze the performance parameters of contact materials, surface roughness, and the relationship between load and contact area. Pitch materials with a higher plasticity index have a larger elastoplastic contact area with the fused silica surface during the polishing process. The experimental results demonstrate that the surface quality of the polished fused silica improves as the plasticity index of the pitch material increases. At the same time, judging from the PSD curve results, the polished surface of the No. 55 pitch on the spatial-frequency band curve (100-101/mm) is significantly lower than the other two brands of pitch. Additionally, the Ra value of the workpiece surface roughness reaches 0.091 nm. The results of this study provide important theoretical guidance for achieving full-diameter, full-frequency ultra-smooth polishing of large-diameter complex curved surfaces.

Automated summary

Fused silica glass is widely used in optical systems, and its surface quality plays a critical role in determining system performance and precision. This study establishes a roughness contact model between pitch and fused silica glass surfaces, and finds that pitch materials with a higher plasticity index can effectively improve the surface quality of the fused silica. The results of this study provide important theoretical guidance for achieving ultra-smooth polishing of large-diameter complex curved surfaces.