Complications in silane-assisted GaN nanowire growth

Understanding the growth mechanisms of III-nitride nanowires is of great importance to realise their full potential. We present a systematic study of silane-assisted GaN nanowire growth on c-sapphire substrates by investigating the surface evolution of the sapphire substrates during the high temperature annealing, nitridation and nucleation steps, and the growth of GaN nanowires. The nucleation step - which transforms the AlN layer formed during the nitridation step to AlGaN - is critical for subsequent silane-assisted GaN nanowire growth. Both Ga-polar and N-polar GaN nanowires were grown with N-polar nanowires growing much faster than the Ga-polar nanowires. On the top surface of the N-polar GaN nanowires protuberance structures were found, which relates to the presence of Ga-polar domains within the nanowires. Detailed morphology studies revealed ring-like features concentric with the protuberance structures, indicating energetically favourable nucleation sites at inversion domain boundaries. Cathodoluminescence studies showed quenching of emission intensity at the protuberance structures, but the impact is limited to the protuberance structure area only and does not extend to the surrounding areas. Hence it should minimally affect the performance of devices whose functions are based on radial heterostructures, suggesting that radial heterostructures remain a promising device structure.

Automated summary

Understanding the growth mechanisms of III-nitride nanowires is crucial for harnessing their full potential. A systematic study explores the growth of silane-assisted GaN nanowires on c-sapphire substrates, investigating the surface evolution of the substrates during annealing, nitridation, and nucleation steps. Both Ga-polar and N-polar GaN nanowires were grown, with N-polar nanowires exhibiting faster growth. The presence of protuberance structures and ring-like features in N-polar GaN nanowires suggests energetically favorable nucleation sites at inversion domain boundaries, while the impact on device performance is confined to the protuberance structure area.