期刊
AIP ADVANCES
卷 6, 期 5, 页码 -出版社
AMER INST PHYSICS
DOI: 10.1063/1.4948794
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资金
- U.S. National Science Foundation [EECS-1407540]
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [1407540] Funding Source: National Science Foundation
Bulk gallium nitride (GaN) power semiconductor devices are gaining significant interest in recent years, creating the need for technology computer aided design (TCAD) simulation to accurately model and optimize these devices. This paper comprehensively reviews and compares different GaN physical models and model parameters in the literature, and discusses the appropriate selection of these models and parameters for TCAD simulation. 2-D drift-diffusion semi-classical simulation is carried out for 2.6 kV and 3.7 kV bulk GaN vertical PN diodes. The simulated forward current-voltage and reverse breakdown characteristics are in good agreement with the measurement data even over a wide temperature range. (C) 2016 Author(s).
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