4.4 Article

Modeling and simulation of bulk gallium nitride power semiconductor devices

期刊

AIP ADVANCES
卷 6, 期 5, 页码 -

出版社

AMER INST PHYSICS
DOI: 10.1063/1.4948794

关键词

-

资金

  1. U.S. National Science Foundation [EECS-1407540]
  2. Div Of Electrical, Commun & Cyber Sys
  3. Directorate For Engineering [1407540] Funding Source: National Science Foundation

向作者/读者索取更多资源

Bulk gallium nitride (GaN) power semiconductor devices are gaining significant interest in recent years, creating the need for technology computer aided design (TCAD) simulation to accurately model and optimize these devices. This paper comprehensively reviews and compares different GaN physical models and model parameters in the literature, and discusses the appropriate selection of these models and parameters for TCAD simulation. 2-D drift-diffusion semi-classical simulation is carried out for 2.6 kV and 3.7 kV bulk GaN vertical PN diodes. The simulated forward current-voltage and reverse breakdown characteristics are in good agreement with the measurement data even over a wide temperature range. (C) 2016 Author(s).

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据