期刊
OPTICAL MATERIALS EXPRESS
卷 6, 期 2, 页码 540-551出版社
OPTICAL SOC AMER
DOI: 10.1364/OME.6.000540
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资金
- Ministry of Science and Technology, Taiwan, ROC [103-2221-E-009-067]
High-power impulse magnetron sputtering (HiPIMS) was used to deposit titanium nitride (TiN) thin films with high electron density as alternative plasmonic materials. TiN thin films with thicknesses of 20-40 nm were deposited with different average sputtering powers, and exhibited metallic-and dielectric-like optical properties. When the sputtering power was increased from 80 W to 300 W, denser polycrystalline TiN thin films were obtained at room temperature (RT) with a conductivity 25 times that of the low-sputtering-power film. With sufficient average power (>= 180 W), the films exhibited metallic-like optical properties, and a conductivity of >10(5) S/m. By using HiPIMS deposition, good-quality metallic-like TiN thin films could be fabricated at RT without heating the substrate. (C) 2016 Optical Society of America
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