期刊
THIN SOLID FILMS
卷 611, 期 -, 页码 78-87出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.tsf.2016.05.006
关键词
Multiferroic; Heterostructures; Atomic layer deposition; Ferromagnetic; Ferroelectric
类别
资金
- European Community [ENHANCE-238409]
- European Regional Development Fund [TK134]
- Estonian Academy of Sciences
- Estonian Research Agency [IUT2-24]
- Finnish Centre of Excellence in Atomic Layer Deposition [284623]
Bismuth iron oxide films with varying contributions from Fe2O3 or Bi2O3 were prepared using atomic layer deposition. Bismuth (III) 2,3-dimethyl-2-butoxide, was used as the bismuth source, iron(III) tert-butoxide as the iron source and water vapor as the oxygen source. The films were deposited as stacks of alternate Bi2O3 and Fe2O3 layers. Films grown at 140 degrees C to the thickness of 200-220 nm were amorphous, but crystallized upon post-deposition annealing at 500 degrees C in nitrogen. Annealing of films with intermittent bismuth and iron oxide layers grown to different thicknesses influenced their surface morphology, crystal structure, composition, electrical and magnetic properties. Implications of multiferroic performance were recognized in the films with the remanent charge polarization varying from 1 to 5 mu C/cm(2) and magnetic coercivity varying from a few up to 8000 A/m. (C) 2016 Elsevier B.V. All rights reserved.
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