4.4 Article

Study of nanostructured Co and Al co-doped ZnO films fabricated by electroless technique

期刊

SURFACE ENGINEERING
卷 32, 期 5, 页码 372-377

出版社

TAYLOR & FRANCIS LTD
DOI: 10.1179/1743294415Y.0000000079

关键词

Electroless deposition; Magnetism; Dilute magnetic semiconductor

向作者/读者索取更多资源

Electroless undoped and Co, Al co-doped ZnO (Zn1-x-yCoxAlyO: x=0.04, 0.03, 0.02; y=0.01, 0.02, 0.03) nanostructured thin films were deposited on soda lime glass in the present work. Microstructure of the ZnO films was strongly influenced by different doping concentrations of Co and Al into ZnO matrix. X-ray diffraction analysis has confirmed the absence of metallic Co or Al clusters apart from wurtzite type ZnO. The field dependence of magnetisation (M-H) curve of different concentration of Co and Al co-doped ZnO films was measured at room temperature. The ferromagnetism with saturation magnetisation (M-s) and coercive field (H-c) of the order of 3.843-4.813x10(-3) (emu) and 400.389-436.769 (Oe) respectively were observed for the doped ZnO thin films. The mechanisms for the ferromagnetism at room temperature in Co and Al co-doped ZnO films are discussed.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据