期刊
SURFACE & COATINGS TECHNOLOGY
卷 305, 期 -, 页码 158-164出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2016.08.023
关键词
Hydrophilicity; Hydrophobicity; Atomic layer deposition; Alumina; Polyvinyl chloride; Surface modification
资金
- Ministry of Science and Technology [101-2325-B-002-013, 103-2218-E-002-028]
Thermal ALD (T-ALD) and plasma-enhanced ALD (PE-ALD) processes were employed to prepare the Al2O3 thin films on plasticized polyvinyl chloride (PVC) surfaces at a low deposition temperature of 80 degrees C. The water contact angle test shows that the T-ALD Al2O3 films exhibited a hydrophobic surface, while the PE-ALD Al2O3 films were hydrophilic. The difference in the surface hydrophobicity is attributed to the carbon residue in Al2O3 films, as revealed by the X-ray photoelectron and Fourier transform infrared spectroscopies. The trend of hydrophobicity follows with the evolution of surface roughness of the T-Al2O3 films, indicating that the surface roughness contributed to the hydrophobicity as predicted by the Wenzel's mode. The result indicates that the surface hydrophilicity/hydrophobicity of the Al2O3 thin films can be modified and controlled by the deposition conditions of the ALD process. (C) 2016 Elsevier B.V. All rights reserved.
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