期刊
SMALL
卷 13, 期 4, 页码 -出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.201601807
关键词
anisotropic wetting behavior; colloidal lithography; gradient materials; ordered micro; nanostructures; wettability library
类别
资金
- National Basic Research Program of China [2012CB933800]
- National Natural Science Foundation of China [21222406, 21474037]
- Program for New Century Excellent Talents in University
- Doctoral Fund of Ministry of Education of China [20130061110019]
- Science and Technology Development Program of Jilin Province
Geometric gradients within ordered micro/nanostructures exhibit unique wetting properties. Well-defined and ordered microsphere arrays with geometric gradient (OMAGG) are successfully fabricated through combining colloidal lithography and inclined reactive ion etching (RIE). During the inclined RIE, the graded etching rates in vertical direction of etcher chamber are the key to generating a geometric gradient. The OMAGG can be used as an effective mask for the preparation of micro/nanostructure arrays with geometric gradient by selective RIE. Through this strategy, a well-defined wettability library with graded silicon cone arrays is fabricated, and the possibility of screening one desired book from the designated wettability library is demonstrated. Meanwhile, the silicon cone arrays with geometric gradient (SCAGG) can be applied to control the wetting behavior of water after being modified by hydrophilic or hydrophobic chemical groups. Based on this result, a temperature-responsive wetting substrate is fabricated by modifying poly n-isopropyl acrylamide (PNIPAM) on the SCAGG. These wettability gradients have great potential in tissue engineering, microfluidic devices, and integrated sensors.
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