期刊
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
卷 31, 期 11, 页码 -出版社
IOP Publishing Ltd
DOI: 10.1088/0268-1242/31/11/115002
关键词
wide band gap semiconductor; beta -Gallium oxide (beta-Ga2O3); Schottky barrier diode; barrier height (q Phi(bn)); ideality factor (n); barrier inhomogeneity
In this paper, the temperature dependence of the turn-on characteristics of Schottky barrier diodes fabricated on ((2) over bar 01) oriented n-type beta-Ga2O3 is reported. The barrier height (q Phi(bn)) and ideality factor (n) for Ni-beta-Ga2O3 was found to be 1.08 +/- 0.05 eV and 1.19 respectively at room temperature. The effective Richardson constant (A**) is determined to be 42.96 A cm(-2) K-2, in close agreement with the theoretical value. At low temperatures (85-273 K), the current-voltage characteristics reveal a strong temperature dependence of Schottky barrier heights and ideality factors and a corresponding deviation from the barrier height extracted from capacitance-voltage measurements. A detailed analysis is presented, which suggest that these effects can be attributed to a large barrier inhomogeneity at metal/beta-Ga2O3 interfaces, possibly resulting from interfacial defects, which can be modeled using a potential fluctuation model.
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