4.4 Article

Study on the strain in a silicon microchannel plate by micro-Raman analysis

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出版社

IOP PUBLISHING LTD
DOI: 10.1088/0268-1242/31/5/055010

关键词

silicon microchannel plates; oxidation; stain; micro-Raman

资金

  1. Shanghai Pujiang Program [14PJ1403600]
  2. Shanghai Fundamental Key Project [11JC1403700]
  3. National Natural Science Foundation of China [61176108]
  4. PCSIRT
  5. Research Innovation Foundation of ECNU [78210245]
  6. City University of Hong Kong Applied Research Grant (ARG) [9667104]

向作者/读者索取更多资源

Micro-Raman analysis was used to identify the oxidation of a silicon microchannel plate (SiMCP) and it indicated that the bend phenomenon of the SiMCP was related to the release of stress and the volume expending of the silicon wall during the oxidation process.

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