期刊
PROGRESS IN PHOTOVOLTAICS
卷 24, 期 9, 页码 1284-1292出版社
WILEY-BLACKWELL
DOI: 10.1002/pip.2776
关键词
photovoltaics; III-V; substrate; reuse
资金
- US Department of Energy [DE-AC36-08GO28308]
- National Renewable Energy Laboratory
- DOE Solar Energy Technologies Office [DE-EE00025784]
The high cost of wafers suitable for epitaxial deposition of III-V solar cells has been a primary barrier to widespread use of these cells in low-concentration and one-sun terrestrial solar applications. A possible solution is to reuse the substrate many times, thus spreading its cost across many cells. We performed a bottom-up techno-economic analysis of three different strategies for substrate reuse in high-volume manufacturing: epitaxial lift-off, spalling, and the use of a porous germanium release layer. The analysis shows that the potential cost reduction resulting from substrate reuse is limited in all three strategies--not by the number of reuse cycles achievable, but by the costs that are incurred in each cycle to prepare the substrate for another epitaxial deposition. The dominant substrate-preparation cost component is different for each of the three strategies, and the cost-ranking of these strategies is subject to change if future developments substantially reduce the cost of epitaxial deposition. Copyright (c) 2016 John Wiley & Sons, Ltd.
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