期刊
CHEMISTRY-A EUROPEAN JOURNAL
卷 21, 期 50, 页码 18029-18032出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/chem.201503632
关键词
hierarchical porosity; mesoporous materials; metal-organic frameworks; plasma etching; UiO-66
资金
- Defense Threat Reduction Agency (DTRA) [BA07PRO104]
The typically stable Zr-based metal-organic frameworks (MOFs) UiO-66 and UiO-66-NH2 were treated with tetrafluoromethane (CF4) and hexafluoroethane (C2F6) plasmas. Through interactions between fluoride radicals from the perfluoroalkane plasma and the zirconium-oxygen bonds of the MOF, the resulting materials showed the development of mesoporosity, creating a hierarchical pore structure. It is anticipated that this strategy can be used as a post-synthetic technique for developing hierarchical networks in a variety of MOFs.
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