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MALDI-TOF MS Study of the Photooxidation of PCBM and Its Suppression by P3HT

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CHEMISTRY LETTERS
卷 44, 期 3, 页码 339-341

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CHEMICAL SOC JAPAN
DOI: 10.1246/cl.141025

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  1. National Institute of Advanced Industrial Science and Technology (AIST)

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The photooxidation of [6,6]-phenyl-C-61-butyric acid methyl ester (PCBM) in thin films and the effects of poly(3-hexylthiophene) (P3HT) on the photooxidation of PCBM were studied using matrix-assisted laser desorption/ionization time-of-flight mass spectrometry. Two reaction routes of PCBM oxidation and its suppression by P3HT were examined for the first time.

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