4.7 Article

Photocatalytical and corrosion behavior of sputtered zirconium oxynitride thin films doped with titanium

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SURFACES AND INTERFACES
卷 42, 期 -, 页码 -

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ELSEVIER
DOI: 10.1016/j.surfin.2023.103488

关键词

Reactive magnetron sputtering; ZrTiON; ZrTiO4; Photodegradation

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ZrTiON coatings were deposited using reactive magnetron sputtering process, with Ti ribbons added to improve the performance. The coatings showed features of oxides, nitrides, and oxynitrides depending on the deposition conditions. Coatings deposited with Ti and a sputtering current of 1.5 A exhibited a more efficient photodegradation effect. Coatings deposited with an applied current of 2 A showed better performance in accelerated corrosion tests.
ZrTiON coatings were deposited by reactive magnetron sputtering process of a single Zr target, while Ti was added by placing Ti ribbons on the erosion track of the Zr sputtering target. The variation of parameters such as the number of Ti ribbons, the applied sputtering current, and the reactive gas flow led to obtaining different sample configurations. The coatings were analyzed in terms of chemistry (chemical composition and chemical states) by X-ray Photoelectron Spectroscopy, morphology by Atomic Force Microscopy, surface energy, photodegradation tests, electrochemical studies, and accelerated corrosion tests. It was found that the coatings show features of oxides, nitrides, and oxynitrides, depending on the deposition conditions applied. The photodegradation efficiency regarding methylene blue solutions under visible light varies between 58% and 96%, depending on the type of illuminant and the sample characteristics, while the lowest corrosion rate was exhibited by the reference samples deposited without the addition of Ti. The samples doped with Ti and deposited with 1.5 A sputtering current exhibited a more efficient photodegradation effect, compared to the reference ZrON sample. The accelerated corrosion tests showed that the coatings deposited with an applied current of 2 A behaved significantly better than the ones deposited with 1.5 A sputtering current after 8 h of exposure to the water vapor and sulfur dioxide gas atmosphere.

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