期刊
CRYSTALS
卷 13, 期 7, 页码 -出版社
MDPI
DOI: 10.3390/cryst13071145
关键词
buffer layer; structural properties; nonpolar GaN
Nonpolar (11 (2) over bar0) a-plane GaN films were grown on semipolar (1 (1) over bar 02) r-plane sapphire substrates using various buffer layers. The structural properties of the films were investigated and it was found that using a composite buffer layer can effectively reduce the density of basal-plane stacking faults (BSFs) and achieve a pit-free surface morphology.
Nonpolar (11 (2) over bar0) a-plane GaN films were grown on semipolar (1 (1) over bar 02) r-plane sapphire substrates using various buffer layers within a low-pressure metal organic chemical vapor deposition system. The structural properties of nonpolar a-plane GaN films were intensively investigated by X-ray diffraction and Raman spectra measurements. A set of buffer layers were adopted from a GaN layer to a composite layer containing a multiple AlN layers and a gradually varied-Al-content AlGaN layer, the full width at half maximum of the X-ray rocking curves measured along the [0001] and [10 (1) over bar0] directions of a-plane GaN were reduced by 35% and 37%, respectively. It was also found that the basal-plane stacking faults (BSFs) density can be effectively reduced by the heterogeneous interface introduced together with the composite buffer layer. An order of magnitude reduction in BSFs density, as low as 2.95 x 10(4) cm (-1), and a pit-free surface morphology were achieved for the a-plane GaN film grown with the composite buffer layer, which is promising for the development of nonpolar GaN-based devices in the future.
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