Effects of RF Magnetron Sputtering Power on the Mechanical Behavior of Zr-Cu-Based Metallic Glass Thin Films

Zirconium-based metallic glass films are promising materials for nanoelectronic and biomedical applications, but their mechanical behavior under different conditions is not well understood. This study investigates the effects of radio frequency (RF) power and test temperature on the nanostructure, morphology, and creep behavior of Zr55Cu30Al10Ni5 metallic glass films prepared by RF magnetron sputtering. The films were characterized by X-ray diffraction and microscopy, and their mechanical properties were measured by a bulge test system. The results show that the films were amorphous and exhibited a transition from noncolumnar to columnar morphology as the RF power increased from 75 W to 125 W. The columnar morphology reduced the creep resistance, Young's modulus, residual stress, and hardness of the films. The creep behavior of the films was also influenced by the test temperature, with higher temperature leading to higher creep strain and lower creep stress. The findings of this study provide insights into the optimization of the sputtering parameters and the design of zirconium-based metallic glass films for various applications.

Automated summary

Zirconium-based metallic glass films prepared by RF magnetron sputtering were studied to investigate the effects of RF power and test temperature on their nanostructure, morphology, and creep behavior. The results showed significant influence of RF power and test temperature on the properties of the films.