Semiempirical Two-Dimensional Model of the Bipolar Resistive Switching Process in Si-NCs/SiO2 Multilayers

In this work, the SET and RESET processes of bipolar resistive switching memories with silicon nanocrystals (Si-NCs) embedded in an oxide matrix is simulated by a stochastic model. This model is based on the estimation of two-dimensional oxygen vacancy configurations and their relationship with the resistive state. The simulation data are compared with the experimental current-voltage data of Si-NCs/SiO2 multilayer-based memristor devices. Devices with 1 and 3 Si-NCs/SiO2 bilayers were analyzed. The Si-NCs are assumed as agglomerates of fixed oxygen vacancies, which promote the formation of conductive filaments (CFs) through the multilayer according to the simulations. In fact, an intermediate resistive state was observed in the forming process (experimental and simulated) of the 3-BL device, which is explained by the preferential generation of oxygen vacancies in the sites that form the complete CFs, through Si-NCs.

Automated summary

In this study, the stochastic model was used to simulate the SET and RESET processes in bipolar resistive switching memories with silicon nanocrystals embedded in an oxide matrix. The simulation data were compared with experimental current-voltage data from Si-NCs/SiO2 multilayer-based memristor devices. The results showed that the Si-NCs act as agglomerates of fixed oxygen vacancies, promoting the formation of conductive filaments through the multilayer. An intermediate resistive state was observed in the forming process of the 3-BL device, which can be explained by the preferential generation of oxygen vacancies through Si-NCs.