Low-Vacuum Catalyst-Free Physical Vapor Deposition and Magnetotransport Properties of Ultrathin Bi2Se3 Nanoribbons

In this work, a simple catalyst-free physical vapor deposition method is optimized by adjusting source material pressure and evaporation time for the reliable obtaining of freestanding nanoribbons with thicknesses below 15 nm. The optimum synthesis temperature, time and pressure were determined for an increased yield of ultrathin Bi2Se3 nanoribbons with thicknesses of 8-15 nm. Physical and electrical characterization of the synthesized Bi2Se3 nanoribbons with thicknesses below 15 nm revealed no degradation of properties of the nanoribbons, as well as the absence of the contribution of trivial bulk charge carriers to the total conductance of the nanoribbons.

Automated summary

A catalyst-free physical vapor deposition method was optimized by adjusting source material pressure and evaporation time to obtain reliable freestanding nanoribbons with thicknesses below 15 nm. The optimum synthesis conditions were determined for increased yield of ultrathin Bi2Se3 nanoribbons with thicknesses of 8-15 nm. The physical and electrical characterization of the synthesized nanoribbons revealed no degradation of properties and the absence of trivial bulk charge carriers.