期刊
NANOTECHNOLOGY
卷 27, 期 21, 页码 -出版社
IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/27/21/215302
关键词
nanosphere lithography; antireflection; nanostructure array
资金
- National Research Foundation (NRF) of the Korean Ministry of Education, Science, and Technology (MEST) [NRF-2014R1A1A2060078]
Broadband optical antireflective arrays of sub-wavelength structures were fabricated on silicon substrates using colloidal nanosphere lithography in conjunction with reactive ion etching. The morphology of the nanostructures, including the shape, base diameter and height, was precisely controlled by modifying the conventional process of nanosphere lithography. We investigated their effects on the optical characteristics based on experimentally measured reflectance performance. The Si nanostructure arrays demonstrated optical antireflection performance with an average reflectance of about 1% across the spectral range from 300 to 800 nm, i.e. near-ultraviolet to visible wavelengths. This fabrication method can be used to create a large surface area and offers a promising approach for antireflective applications.
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