Solution Plasma for Surface Design of Advanced Photocatalysts

Rational design of the surface of photocatalysts can conveniently modulate the photo-stimulated charge separation, influence the surface reaction kinetics, and other pivotal factors in the photocatalytic processes for efficient photocatalysis. Solution plasma, holding promise for mild modification of the surface structure of materials, has recently been recognized as an emerging technology for surface engineering of high-performance photocatalysts. In this review, we will briefly introduce the fundamentals of solution plasma and its applications in materials preparation and summarize the recent research progress in the surface design of advanced photocatalysts by solution plasma. Lastly, we will indicate some possible new directions. This review is expected to provide an instructive guideline for the surface design of heterogeneous photocatalysts by solution plasma.

Automated summary

Rational design of the surface of photocatalysts can effectively enhance the efficiency of photocatalysis by modulating charge separation and surface reaction kinetics. Solution plasma, as an emerging technology for surface engineering, provides a promising method for modifying the surface structure of high-performance photocatalysts. This review introduces the fundamentals of solution plasma, its applications in materials preparation, and summarizes the recent research progress in surface design of advanced photocatalysts. Possible new directions for future research are also discussed.