期刊
NANOSCALE
卷 8, 期 1, 页码 136-140出版社
ROYAL SOC CHEMISTRY
DOI: 10.1039/c5nr06815k
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- Center for Nanostructured Graphene - Danish National Research Foundation [DNRF58]
- Dept. of Micro and Nanotechnology at the Technical University of Denmark
Block copolymer (BC) self-assembly constitutes a powerful platform for nanolithography. However, there is a need for a general approach to BC lithography that critically considers all the steps from substrate preparation to the final pattern transfer. We present a procedure that significantly simplifies the main stream BC lithography process, showing a broad substrate tolerance and allowing for efficient pattern transfer over wafer scale. PDMS-rich poly (styrene-b-dimethylsiloxane) (PS-b-PDMS) copolymers are directly applied on substrates including polymers, silicon and graphene. A single oxygen plasma treatment enables formation of the oxidized PDMS hard mask, PS block removal and polymer or graphene substrate patterning.
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