Laser maskless fast patterning for multitype microsupercapacitors

Downsizing electrode architectures have significant potential for microscale energy storage devices. Asymmetric micro-supercapacitors play an essential role in various applications due to their high voltage window and energy density. However, efficient production and sophisticated miniaturization of asymmetric micro-supercapacitors remains challenging. Here, we develop a maskless ultrafast fabrication of multitype micron-sized (10 x 10 & mu;m(2)) micro-supercapacitors via temporally and spatially shaped femtosecond laser. MXene/1T-MoS2 can be integrated with laser-induced MXene-derived TiO2 and 1T-MoS2-derived MoO3 to generate over 6,000 symmetric micro-supercapacitors or 3,000 asymmetric micro-supercapacitors with high-resolution (200 nm) per minute. The asymmetric micro-supercapacitors can be integrated with other micro devices, thanks to the ultrahigh specific capacitance (220 mF cm(-2) and 1101 F cm(-3)), voltage windows in series (52 V), energy density (0.495 Wh cm(-3)) and power density (28 kW cm(-3)). Our approach enables the industrial manufacturing of multitype micro-supercapacitors and improves the feasibility and flexibility of micro-supercapacitors in practical applications. Miniature asymmetric supercapacitors have higher voltage and energy density but are often limited by a complex manufacturing process and difficulties in further miniaturization. Here, the authors demonstrate a maskless method for the patterned fabrication of submicron-scale symmetric and asymmetric supercapacitors.

Automated summary

The authors have developed a maskless ultrafast fabrication method for producing micron-sized micro-supercapacitors. These micro-supercapacitors demonstrate high specific capacitance, voltage windows, energy density, and power density. They can be integrated with other micro devices and have potential for use in various applications.