Effect of two-step cubic GaN buffer layer on the radio-frequency plasma-assisted molecular beam epitaxy growth of cubic AlN films grown on MgO (001) substrates

Cubic AlN (c-AlN) films were grown on MgO (001) substrates through the use of a two-step cubic GaN (c-GaN) buffer layer using radio-frequency plasma-assisted molecular beam epitaxy (RF-MBE) technique. The two-step cGaN buffer layer was found to be crucial for the epitaxial growth of c-AlN, as it showed a specific epitaxial relationship between c-AlN and c-GaN along the MgO [100] zone axis. On the other hand, the c-AlN films grown with the one-step and nonGaN buffer layers showed columnar grain structure. The optical study found that the cAlN films grown with the two-step c-GaN buffer layer had an indirect bandgap energy of 4.99 +/- 0.02 eV, which is consistent with previous experimental data and theoretical calculations. The c-AlN films grown with the one-step and nonGaN buffer layers had indirect bandgap energies of 5.00 +/- 0.02 eV and 5.18 +/- 0.02 eV, respectively. These results highlight the importance of the two-step c-GaN buffer layer in enhancing the MBE growth of c-AlN on MgO (001) substrate.

Automated summary

Cubic AlN films were successfully grown on MgO substrates using a two-step cubic GaN buffer layer. The two-step buffer layer was found to play a crucial role in the epitaxial growth of c-AlN, resulting in improved crystallinity compared to one-step and nonGaN buffer layers.