4.6 Article

Highly Tunable MOCVD Process of Vanadium Dioxide Thin Films: Relationship between Structural/Morphological Features and Electrodynamic Properties

期刊

SENSORS
卷 23, 期 16, 页码 -

出版社

MDPI
DOI: 10.3390/s23167270

关键词

monoclinic structure; X-ray powder pattern; THz properties

向作者/读者索取更多资源

The fine control of crystal habit of vanadium dioxide has been achieved through an in-depth study of MOCVD synthetic approach. The compositional purity, morphology, and thickness of VO2 films have been assessed through EDX analyses and FE-SEM. The functional properties of the as-prepared VO2 films have been validated using THz time domain spectroscopy.
The monoclinic structures of vanadium dioxide are widely studied as appealing systems due to a plethora of functional properties in several technological fields. In particular, the possibility to obtain the VO2 material in the form of thin film with a high control of structure and morphology represents a key issue for their use in THz devices and sensors. Herein, a fine control of the crystal habit has been addressed through an in-depth study of the metal organic chemical vapor deposition (MOCVD) synthetic approach. The focus is devoted to the key operative parameters such as deposition temperature inside the reactor in order to stabilize the P2(1)/c or the C2/m monoclinic VO2 structures. Furthermore, the compositional purity, the morphology and the thickness of the VO2 films have been assessed through energy dispersive X-ray (EDX) analyses and field-emission scanning electron microscopy (FE-SEM), respectively. THz time domain spectroscopy is used to validate at very high frequency the functional properties of the as-prepared VO2 films.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.6
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据