期刊
MOLECULES
卷 21, 期 12, 页码 -出版社
MDPI AG
DOI: 10.3390/molecules21121711
关键词
plasma processing; fluorinated thin films; nanostructured surfaces; superhydrophobic surfaces
资金
- National Authority for Research and Innovation in the frame of Nucleus programme [4N/2016]
Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by plasma treatment in a sulphur hexafluoride environment. We showed that conformal fluorinated thin films can be obtained and, according to the initial surface properties, superhydrophobic surfaces can be achieved.
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