Recent developments in photoresists for extreme-ultraviolet lithography

This report describes recent developments and current needs in the field of high-resolution photopolymers and photomolecules briefly describing prior generation lithographic patterning materials. It subsequently concen-trates on recent advances in both inorganic and polymeric materials for extreme ultraviolet (EUV) lithography. It is also part of a series of papers written in celebration of the centenary of the Polymeric Materials: Science and Engineering (PMSE) division of the American Chemical Society (ACS). PMSE has long been home to polymer chemists who have made important contributions to advances in semiconductor manufacturing as a result of PMSE's focus on polymer coatings research. While EUV lithography has been an area of research for several decades, only within the last 5 years has the combination of new light sources, EUV optics, tool advances and resist discoveries come together to transition this area from the patterning method of the future to a leading-edge manufacturing technology. (148 words).

Automated summary

This report provides an overview of recent developments and current needs in high-resolution photopolymers and photomolecules, focusing on advancements in EUV lithography. It is part of a series of papers celebrating the centenary of the PMSE division of ACS, which has made significant contributions to semiconductor manufacturing through polymer coatings research. Only in the past 5 years has EUV lithography evolved from a future patterning method to a cutting-edge manufacturing technology, thanks to new light sources, EUV optics, tool advancements, and resist discoveries. (125 words)