4.7 Article

Precise preparation of quartz pendulous reed by using picosecond laser modification assisted wet etching

期刊

OPTICS AND LASER TECHNOLOGY
卷 163, 期 -, 页码 -

出版社

ELSEVIER SCI LTD
DOI: 10.1016/j.optlastec.2023.109341

关键词

Quartz pendulous reed; Bessel beam; Picosecond laser modification; Laser assisted wet etching

向作者/读者索取更多资源

This paper proposes a picosecond laser modification assisted wet etching technology to prepare the quartz pendulous reed, which is the core part of the quartz flexible accelerometer. The modification mechanism of fused silica induced by picosecond laser was investigated, and the mapping among etching time, etching temperature, and HF solution concentration was studied. The proposed technology has the advantages of high dimensional accuracy, good edge quality, low residual stress, and high efficiency.
The Quartz pendulous reed is the core part of the quartz flexible accelerometer. The current quartz pendulous reed forming technology has shortcomings, such as poor processing quality and high production cost. In this paper, picosecond laser modification assisted wet etching technology is proposed to prepare quartz pendulous reed. The modification mechanism of fused silica induced by picosecond laser was investigated. Different from the network structure changes caused by femtosecond laser, mechanical damage is the main form of picosecond laser modification. The mapping among etching time, etching temperature and HF solution concentration were studied by using the control variable method. The proposed picosecond laser assisted wet etching technology has the advantages of high dimensional accuracy, good edge quality, low residual stress, and high efficiency.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.7
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据