Vapor deposited CeO2 nanostructures by atmospheric plasma spray with reversible wettability

The construction of nanostructures on the coating surface by vapor deposition of CeO2 was realized during at-mospheric plasma spraying (APS). The backside deposition method was specially designed to demonstrate the occurrence of vapor deposition and to collect pure vapor-deposited nanostructures for performance development. The effects of high-temperature and high-speed deposition conditions, the intrinsic high vapor pressure of CeO2, and the agglomerated porous feature of the powder on the formation of vapor phase were discussed and the deposition mechanism was revealed. The study developed the reversible wettability of vapor-deposited nano -structures under vacuum and UV-O3 alternate treatment.

Automated summary

The study achieved the construction of nanostructures on the coating surface by vapor deposition of CeO2 during atmospheric plasma spraying. The backside deposition method was employed to demonstrate the occurrence of vapor deposition and collect pure vapor-deposited nanostructures for improved performance. The effects of high-temperature and high-speed deposition conditions, the high vapor pressure of CeO2, and the agglomerated porous feature of the powder on vapor phase formation were discussed, and the deposition mechanism was revealed. The study also developed the reversible wettability of vapor-deposited nanostructures through vacuum and UV-O3 alternate treatment.