4.6 Article

Doping-induced Ti3+state and oxygen vacancies in TiO2: A single-chip combinatorial investigation

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MATERIALS CHEMISTRY AND PHYSICS
卷 308, 期 -, 页码 -

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ELSEVIER SCIENCE SA
DOI: 10.1016/j.matchemphys.2023.128283

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Excess electrons; Nb doping; Ti reduction; Oxygen vacancies; TiO2

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In this work, the formation of oxygen vacancies (VO) and Ti3+ ions induced by n-type doping of TiO2 with Nb is demonstrated using a combinatorial investigation approach. The results show that the introduction of Nb donors can increase the luminescence intensity and enhance the photocatalytic efficiency of TiO2. Additionally, two different post-growth treatment approaches are shown to further increase the near-surface VO density without affecting the valence state of Ti, providing opportunities for defect engineering to optimize the photocatalytic properties of TiO2.
TiO2 is widely recognized as a high performance photocatalyst for photocatalytic applications. Oxygen vacancies (VO) and titanium defects are known to make a significant contribution to the enhanced photocatalytic efficiency of TiO2, accordingly control of these two centers is pivotal to optimizing the surface photochemical activity. In this work, the formation of VO and Ti3+ ions induced by n-type doping of TiO2 with Nb is demonstrated using a combinatorial investigation approach. Chemical Beam Vapour Deposition (CBVD) is used to fabricate Nb concentration-graded (NbxTi1-x)O2 anatase films with 0.009 & LE; x & LE; 0.033 over a 5 mm length on a single chip. Cathodoluminescence (CL) microanalysis shows the luminescence intensity decreases with increasing Nb concentration; however, the presence of a self-trapped exciton (STE) emission, characteristic of anatase TiO2, indicates that the Nb incorporation does not affect the structural properties of TiO2. Notably, the introduction of Nb donors induces the formation of the signature luminescence bands of VO and Ti3+ at 2.05 and 2.60 eV at 80 K, respectively, and their intensities rise by up to 28% with increasing Nb content. The formation of VO and Ti3+ is attributed to the effect of excess electrons locally produced by Nb donor doping. The thermal activation energies for the STE and defect-related emissions are found to be identical at 32 & PLUSMN; 4 meV, suggesting that the recombination kinetics is mediated by Nb donors. Significantly, we demonstrate that the near-surface VO density can be further increased by two different post-growth treatment approaches: (i) remote hydrogen plasma and (ii) lowenergy electron beam irradiation (LEEBI), without effecting the valence state of Ti. Our results open opportunities to optimize the photocatalytic properties of TiO2 by defect engineering.

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