期刊
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
卷 160, 期 -, 页码 46-54出版社
JOURNAL MATER SCI TECHNOL
DOI: 10.1016/j.jmst.2023.03.020
关键词
Photoinduced corrosion; Copper; SVET; P -type semiconductor
The study investigates the electrochemical and photoelectrochemical behaviors of Cu electrodeposited with Cu2O layer. The corrosion of Cu is intensified under AM 1.5 illumination, especially the anodic process. The photoinduced corrosion of Cu by Cu2O is detected, and the promotion of Cu corrosion under illumination is attributed to the narrowed depletion layer in Cu2O and the facilitated separation of hole-electron pairs.
The electrochemical associated with photoelectrochemical behaviors of Cu electrodeposited with Cu 2 O layer were investigated in this work. The corrosion of Cu was promoted due to the enhanced anodic and cathodic processes under AM 1.5illumination compared with that in the darkness, especially for the anodic process. The photoinduced corrosion of Cu by Cu 2 O was detected by Scanning Vibrating Electro Technique (SVET). The effect of Cu 2 O on the promotion of Cu corrosion under illumination can be ascribed to the narrowed depletion layer in Cu 2 O under illumination, which facilitates the separation of hole-electron pairs. The resultant holes give rise to the oxidation of the Cu matrix and lead to a promoted corrosion consequently. Besides, a method for in-situ determining the photoinduced current of a semiconductor material is proposed. (c) 2023 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
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