期刊
MICROELECTRONIC ENGINEERING
卷 164, 期 -, 页码 14-19出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/j.mee.2016.07.002
关键词
Thin film transistor; NH3 and N2O plasma; SiOxNy ultra-thin layer; ELA poly-silicon; Kink effect reduction
资金
- New & Renewable Energy Core Technology Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) from the Ministry of Trade, Industry & Energy, Republic of Korea [20143030011960]
- Basic Science Research Program through the National Research Foundation of Korea (NRF) - Ministry of Education [NRF-2013 R1A1A2064769]
The role of SiOxNy thin layer growth on excimer laser annealed (ELA) polysilicon, by N2O plasma treatment, on the stability improvement under prolonged operation and bias stress of TFT was investigated. After NH3 plasma treatment, field effect mobility in p-channel TFT devices increased from 50 to 76 cm(2) V-1 s(-1), ON/OFF current ratio improved to 4.6 x 10(7), threshold voltage shrank from -9.8 V to -7.7 V and kink effect in the H-p-V-p characteristics was diminished. Using NH3 plasma treatment combined with SiOxNy layer indicated a lesser effectiveness in decreasing interface states, but better in reducing of the influence of mobile charges on TFT performance, than the previous approaches. An improvement in field effect mobility of 60.5 cm(2) V-1 s(-1), excellent stability under bias stress of +/- 1 MV.cm(-1) for 2 h with AVth similar to 0.1 V were achieved. We found that under NH3 plasma treatment combined with SiNxOy thin layer; the,effect of hot carrier injection were reduced significantly due to creating the Si-N, and Si-O bonding at the interface of gate insulator and active layer. This result indicated that thin film transistor using NH3 plasma treatment with SiOxNy passivated layer promises to improve TFT performances with high field effect mobility, high ON/OFF current ratio, low leakage current and excellent stability. (C) 2016 Elsevier B.V. All rights reserved.
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