Low temperature deposition of 2D WS2 layers from WF6 and H2S precursors: impact of reducing agents

We demonstrate the impact of reducing agents for Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) of WS2 from WF6 and H2S precursors. Nanocrystalline WS2 layers with a two-dimensional structure can be obtained at low deposition temperatures (300-450 degrees C) without using a template or anneal.