4.1 Article

Characterization of silver oxide thin films with thickness variation prepared by thermal evaporation method

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VIRTUAL CO PHYSICS SRL
DOI: 10.15251/DJNB.2023.183.1039

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Silver oxide films; Thermal evaporation; X-ray diffraction; AFM

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The thermal evaporation technique was used to produce AgO thin films, and it was found that the crystal quality of the films was influenced by the thin and sharp peaks at the (111) planes. Atomic Force Microscopy observations confirmed that the grains in all films had a nanostructure and were distributed homogeneously. With increasing film thickness, the surface roughness decreased and the optical constants showed fluctuation.
Thermal evaporation technique has been used to produce silver oxide (AgO). The findings demonstrate that the crystal quality of the AgO film was dominated by the thin and sharp peaks at (111) plans. Atomic Force Microscopy (AFM) confirm that the distribution grains size appears nanostructure and homogeneous in all films. RMS decreased from 6.84 nm to 2.17 nm with thicknesses 200 nm. The surface roughness decreased from 7.82 nm to 3.22 nm. The distribution of grains size appears nanostructured and homogeneous in all films, and a slight decrease in average particle size. The surface displayed that the roughness decreased with the increase in thicknesses. The spectrum fluctuation of their optical constants has been calculated using transmittance and absorption data. In the visible region of the wavelength, all films have a high absorption coefficient with a value of 104 (cm-1). According to the optical measurements, the films have a band gap between 1.73 and 1.61 eV. The Extinction coefficient and refractive index drop as film thickness rises.

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