期刊
CHEMICAL ENGINEERING JOURNAL
卷 473, 期 -, 页码 -出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.cej.2023.145296
关键词
Confinement engineering; Two-dimensional nanosheets; Synergistic effect; Microwave absorption
A novel space-confined strategy is proposed to develop two-dimensional SiO2 nano-sheets with controllable structures, providing a universal approach for other metal-based SiO2 nanosheets. The resulting Co-2DSiO2 heterostructure exhibits uniform dispersion and nearly single domain size, achieving fascinating electromagnetic properties by regulating the size of nano-Co at varied temperatures.
Advanced electromagnetic (EM) absorbers containing magnetic and dielectric components have garnered sub-stantial attention due to rapid expansion of wireless communication equipment. However, the EM absorbing performance of magnetic materials is greatly hindered by the substantial decrease in permeability at gigahertz frequencies, commonly referred to the Snoek limit. Confinement engineering provides effective strategy for precisely modulating particle size in a confined region to enhance the surface anisotropy and thereby surpass the Snoek limit. Herein, a novel space-confined strategy is proposed to develop two-dimensional (2D) SiO2 nano-sheets that involves manipulating the topological exfoliation of CaSi2 with CoCl2 and thereafter high-temperature reduction. The resulting SiO2 supported nano-Co (Co-2DSiO2) heterostructure exhibits uniform dispersion and nearly single domain size. Contributing to the magnetic-dielectric synergistic effect, fascinating EM properties can be achieved by regulating the size of nano-Co at varied temperatures, and the Co-2DSiO2 delivers the optimal reflection loss of -51.6 dB at 2.5 mm and the effective absorption bandwidth of 4.6 GHz. Electronic structures of Co-2DSiO2 were simulated by theoretical calculation, further verifying the potential mechanism of enhanced dielectric loss and analyzing the formation of heterostructure. The proposed confinement strategy lays the groundwork for the development of advanced absorbers and provides a universal approach for other metal-based SiO2 nanosheets with tunable structures.
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