期刊
ACS APPLIED MATERIALS & INTERFACES
卷 -, 期 -, 页码 -出版社
AMER CHEMICAL SOC
DOI: 10.1021/acsami.3c07971
关键词
Ti-Cu thin films; materials design; textile functionalization; EMI shielding; electromechanicalresponse
This study investigates the potential of thin-film technology in the development of new electromagnetic interference shielding and conductive materials for textiles and wearables. The study used three different thin films (pure Ti, pure Cu, and Ti-doped Cu) to enhance textile knits made of cotton and lyocell fibers. The films exhibited varying structures, morphologies, and topographies based on their chemical compositions. The effectiveness of these functionalized knits in shielding against EMI was evaluated, as well as their electrical response under stress.
This study explores the potential of integrating thin-filmtechnologyin the design of new and effective electromagnetic interference (EMI)shielding and conductive materials for textiles and wearables. Thisapplication is of particular interest to the textile industry as itcan bring new functionalities to wearables and protect humans fromprolonged exposure to EM radiation. Three different thin films ofpure Ti, pure Cu, and Ti-doped with Cu prepared by magnetron sputteringwere used to functionalize textile knits based on cotton (code 39F)and lyocell fibers (62I). The films displayed different crystallinestructures, morphologies, and topographies, which depended on theirchemical compositions. The shielding effectiveness (SE) of the functionalizedknits against EMI was evaluated in the frequency range of 2-8GHz. Also, the electrical response under stress was assessed sincethe electrical conductivity is closely related to the EMI shieldingeffectiveness. The results demonstrate the feasibility of using athin conductive layer based on Cu or Ti-Cu to improve the shieldtextiles with great adhesion and low thickness, providing an interestingpath to improve shielding efficiency for EMI without modifying theflexibility of the textiles.
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