4.8 Article

Transparent and Robust Superhydrophobic Structure on Silica Glass Processed with Microstereolithography Printing

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 15, 期 31, 页码 38132-38142

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.3c08125

关键词

microstereolithography; silica glass; superhydrophobicstructures; high transmittance; mechanical robustness

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Silica glass devices can be protected from abrasion and contamination by integrating robust and transparent superhydrophobic structures on their surfaces. This is achieved through microstereolithography and heat treatment processes to create a biomimetic frame filled with nanoparticles on the silica surface. The resulting composite structure maintains high mechanical robustness and excellent transmittance, expanding the application field of silica glass devices.
Silica glass devices are widely used due to their exceptionalphysicaland chemical properties. However, prolonged usage may result in abrasionand contamination of silica glass devices, adversely affecting theservice life. One of the most effective solutions to this issue issurface modification, in which superhydrophobicity with high transmittanceand mechanical robustness is highly desired. Inspired by the conceptof protective armor, we proposed a novel approach for the direct integrationof robust and transparent superhydrophobic structures on silica glass.In this method, microstereolithography synergistic heat treatmentprocesses are used to create a micrometer-scale biomimetic frame onthe surface of silica glass and then filled with in situ depositednanoparticles. The superhydrophobicity of the surface can be obtainedthrough the nanoparticles, and the biomimetic frame can protect thesurface from direct contact with external objects to achieve durability.This process allows the preparation of superhydrophobic silica structureson the silica device surface at temperatures below its melting point,which prevents any damage to the devices during the heat treatment.Moreover, up to 90% transmittance does not affect the performanceof silica devices. The composite structure maintains a contact angleof over 150 & DEG; after multiple abrasion tests, verifying the mechanicalrobustness. This innovative process paves the way for forming a highmechanical robustness and excellent transmittance protective layeron silica glass devices, which expands the application field.

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