Characterisation of TiO2 nanoparticles on porous silicon for optoelectronics application

TiO2 nanoparticles (TiO2 NPs) were prepared by pulsed ablation in liquid for ablation of a titanium target immersed in deionised water, while porous silicon (PS) is synthesised by photoelectrochemical etching (PECE) of n-type silicon. TiO2 NPs colloidal solution is deposited on PS by drop casting technique. The X-ray diffraction techniques and scanning electron microscopy confirm the formation of anatase TiO2 NPs with 36-124 nm size. Atomic force microscopy shows that PS has spongelike structure with 14.18 nm average pore diameter. Capacitance-voltage (C-V) measurement of Al/TiO2 NPs/PS/n-Si/Al detector revealed an abrupt junction. Al/TiO2 NPs/PS/n-Si/Al detector has showed low reflectivity with good responsivity of 0.053 A/W and 2.08 x 10(12) W-1 cm Hz(1/2)specific detectivity.