Focusing and Wavefront Splitting of an Extreme Ultraviolet Laser with a Tubular Optical Element

A capillary discharge extreme ultraviolet laser is focused and wavefront split at 46.9 nm by a tubular optical element. The reflectivity at 46.9 nm is both simulated and measured to be higher than 90% with a slight optical aberration. The operating principle of the tubular element for focusing and wavefront splitting is discussed. Dense and intense grating-like fringes with a period of similar to 150 nm are achieved. The method used in this work allows nano-scale processing with extreme ultraviolet laser at single-shot exposure mode.

Automated summary

This article introduces a capillary discharge extreme ultraviolet laser that is focused and wavefront split at 46.9 nm using a tubular optical element. The reflectivity at 46.9 nm is both simulated and measured to be higher than 90% with slight optical aberration. The operating principle of the tubular element for focusing and wavefront splitting is discussed. Dense and intense grating-like fringes with a period of about 150 nm are achieved. The method used in this work allows for nano-scale processing with extreme ultraviolet laser in single-shot exposure mode.