Thin films sputter-deposited from EUROFER97 in argon and deuterium atmosphere: Material properties and deuterium retention

Sputter-deposited thin films (33-1160 nm) from EUROFER97 were obtained on different substrates (C, Si, W, MgO) in argon and a mix of argon and deuterium atmosphere. The composition, microstructure, and mechanical properties of the films were analyzed and compared to those of the bulk material. The films feature lower density (-10%), higher hardness (+79%), and smaller crystallites in comparison to the bulk. Despite such differences, the elemental atomic composition of the films and the bulk was very similar, as determined by ion beam analysis. Deposition in deuterium-containing atmosphere resulted in a low deuterium incorporation (0.28% of atomic content), indicating low retention of hydrogen-isotopes in the deposited material.

Automated summary

Sputter-deposited thin films (33-1160 nm) from EUROFER97 were obtained and analyzed on different substrates (C, Si, W, MgO) in argon and a mix of argon and deuterium atmosphere. The films exhibited lower density, higher hardness, and smaller crystallites compared to the bulk material, while their atomic composition was similar. Deposition in a deuterium-containing atmosphere resulted in low deuterium incorporation, suggesting low retention of hydrogen-isotopes.