4.6 Article

N-Polar Indium Nitride Quantum Dashes and Quantum Wire-like Structures: MOCVD Growth and Characterization

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Summary: A series of N-polar InN epilayers were grown at various temperatures using plasma-assisted molecular beam epitaxy on GaN/AlN/Al2O3(0001) templates. Different island distributions and shapes were observed at varying growth temperatures, but the samples were identified as single crystalline phase regardless of temperature. Increasing the growth temperature up to 560 degrees C improved the crystalline quality, while excessively high temperatures led to degradation of quality.

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