期刊
CRYSTALS
卷 13, 期 6, 页码 -出版社
MDPI
DOI: 10.3390/cryst13060898
关键词
Si-doped beta-Ga2O3; nanowires; LPCVD
Ultra-long Si-doped beta-Ga2O3 nanowires were prepared on annealed Al2O3-film/Si substrate by low-pressure chemical vapor deposition (LPCVD) with Au as catalyst. The nanowires have a length over 300 μm and diameters ranging from about 30 nm to about 100 nm in one-dimensional structures. Their crystal quality is good with (201) orientation confirmed by transmission electron microscopy and X-ray diffraction analysis. The nanowires exhibit three obvious blue luminescence peaks and good conductivity. A metal-semiconductor-metal device made with Ti/Au electrode shows a device current of 200 pA at a bias voltage of 3 V. The results demonstrate the direct growth of ultra-long Si-doped beta-Ga2O3 nanowires on Al2O3-film/Si substrates, which have a high length-diameter ratio and good electrical properties. A possible Si doping mechanism is also proposed.
In this work, we prepared ultra-long Si-doped beta-Ga2O3 nanowires on annealed Al2O3-film/Si substrate by low-pressure chemical vapor deposition (LPCVD) assisted by Au as catalyst. The length of nanowires exceeds 300 mu m and diameters range from similar to 30 to similar to 100 nm in one-dimensional structures. The nanowires show good crystal quality and exhibit (201) orientation, confirmed by transmission electron microscopy and X-ray diffraction analysis. The PL spectrum obtained from these beta-Ga2O3 nanowires has three obvious blue luminescence peaks at 398 nm (3.12 eV), 440 nm (2.82 eV), and 492 nm (2.51 eV). The electrical properties obtained from Si-doped beta-Ga2O3. nanowires exhibit good conductivity. A metal-semiconductor-metal device is made by using Ti/Au as the electrode, and the device current reaches 200 pA at a bias voltage of 3 V. Our results show that ultra-long Si-doped beta-Ga2O3 nanowires can be grown directly on the surface of Al2O3-film/Si substrates. These nanowires have a very high length-diameter ratio and good electrical properties. A possible mechanism for Si doping is also presented.
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