4.3 Article

Structural, Optical and Electrical Properties of Undoped, Doped LaPO4 and Cu/Sn-LaPO4/N-Si Type Schottky Barrier Diode

期刊

SILICON
卷 15, 期 11, 页码 4811-4821

出版社

SPRINGER
DOI: 10.1007/s12633-023-02366-x

关键词

Co-precipitation; Schottky barrier diode; Sn-LaPO4; Interfacial layer; Photodiodes

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In this study, a Cu/Sn-LaPO4/n-Si MIS Schottky barrier diode with 10% Sn doping was successfully fabricated and its photodiode properties were investigated. The photodiode parameters, such as barrier height, ideality factor, and saturation currents, were determined from the I-V forward and reverse bias curves using the thermionic emission theory. The experimental results of the 10% Sn-LaPO4 SBDs showed a linear decrease in the ideality factor (n) to 2.31 and 1.74, respectively, with a small increase in the effective barrier height (phi(B)) of 0.744 and 0.806 eV in dark and light conditions, indicating their potential use in optoelectronic industries.
The Cu/Sn-LaPO4/n-Si MIS Schottky barrier diode (SBD) with a 10% Sn doping has been successfully fabricated, and their photodiode properties were investigated. The I-V forward and reverse bias curves determine the photodiode parameters such as barrier height, ideality factor, and saturation currents from the thermionic emission theory. The results of the experiments with 10% Sn-LaPO4 SBDs showed a linear decrease in the ideality factor (n) up to 2.31 and 1.74, respectively, with a small increase in the effective barrier height (phi(B)) of 0.744 and 0.806 eV in dark and light conditions these results signify their use in optoelectronic industries.

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