Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers

We developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. The process includes a floating-layer technique to coat the cantilevers in an electron-beam resist. We demonstrate gate definition through a lift-off process and through an etching process. The cantilevers maintain a high force sensitivity after undergoing the patterning process. Our method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors.(c) 2023 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

Automated summary

We have developed a process to fabricate nanoscale metallic gate electrodes on scanning probe cantilevers, including on the irregular surface of protruding cantilever tips. Gate definition is achieved through a lift-off process and an etching process. This method allows the patterning of nanoscale devices on fragile scanning probes, extending their functionality as sensors.