Effect of substrate bias voltage on structural and tribological properties of W-Ti-C-N thin films produced by combinational HiPIMS and DCMS co-sputtering

Protective multi-component thin films at the surface of cutting tools have been significantly developed to reduce wear and friction. The present work investigates the effect of substrate bias voltage on the structural-tribological relations of W-Ti-C-N thin films produced by HiPIMS and DCMS co-sputtering. Chemical analysis of the coatings is obtained and composite phase structure is revealed. Morphology of the coatings illustrates that defectless surfaces may be achieved. Topographical parameters are investigated by employing graphical software. Inden-tation, scratch and pin-on-disk tests (pin is AISI 52100 steel) are applied to study mechanical behaviors of the films. To produce a wear-resistant film, a median bias voltage (-60 V) and as a result, optimum content of tungsten concentration (19.2 at. %), grain size (42.8 nm) and average peak interval (188 nm) is required. Finally, a model based on the representative volume element is developed to show crack propagation and delamination.

Automated summary

The present work investigates the effect of substrate bias voltage on the structural-tribological relations of W-Ti-C-N thin films. Chemical analysis of the coatings is obtained and composite phase structure is revealed. The morphology of the coatings illustrates that defectless surfaces may be achieved. Indentation, scratch, and pin-on-disk tests are applied to study the mechanical behaviors of the films. A model based on the representative volume element is developed to show crack propagation and delamination.