Magnetron deposition of copper oxide coatings in a metallic mode enhanced by RF-ICP source: A role of substrate biasing

The article describes deposition of copper oxide coatings using magnetron sputtering in a metallic mode enhanced by a radio-frequency inductively coupled plasma (RF-ICP) source. The role of substrate biasing (floating potential,-70 and-140 V) on structural properties and elemental composition of copper oxide coatings is determined using SEM with EDS, XRD and TEM. This study shows the change of coating micro-structure from columnar to dense/compact and the increase in crystallinity degree of coatings, when the sub-strate is biased. EDS analysis reveals the presence of Ar and the increase in O content in the coating due to intensive ion bombardment. Deposition conditions are changed using substrate biasing, which suggests the contribution of ion bombardment to the coating deposition in the case of magnetron sputtering of copper oxide in the metallic mode.

Automated summary

The article discusses the deposition of copper oxide coatings using magnetron sputtering in a metallic mode enhanced by RF-ICP source. The effects of substrate biasing on the structural and elemental properties of the coatings were investigated using SEM with EDS, XRD, and TEM. The study showed that biased substrate led to a change in coating microstructure, increased crystallinity, and elevated oxygen content due to ion bombardment.