期刊
VACUUM
卷 209, 期 -, 页码 -出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2022.111792
关键词
Simulation; Plasma; Vacuum; Surface; Ion pump
This article presents the working principles of the sputter-ion pump and the method to simulate its performance using a model based on design parameters. The ion pumps from Agilent Technologies, including Diode VIP 40, 55, and 75, are used as reference for the simulation.
The sputter-ion pump is a capture vacuum pump which operates by sputtering a getter material. Nowadays the most common design is based on a Penning trap. In this work we will study the operating principles of the pump and we will build a model that, starting from design parameters, allows us to simulate its performances. We will consider the ion pumps from Agilent Technologies as a reference for our simulation: the Agilent Diode VIP 40, 55 and 75.
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