Structural characteristics and gas sensing response of V2O5 nanorod thinfilms deposited by hot filament CVD

Using the novel hot filament chemical vapor deposition (HFCVD) technique, thinfilms of vanadium pentoxide (V2O5) were deposited under various conditions. The structural characteristics and gas sensing response of the thinfilms were investigated. X-ray diffraction shows that the thinfilms are orthorhombic V2O5 with (001) preferred orientation. Scanning electron microscopy observation reveals that nanorod thinfilms could be ob-tained under optimized oxygen content and substrate to filament distance. The sensing response of the nanorod thinfilm towards ammonia and ethanol were tested. It exhibits a sensing response of 1.557 and 1.721 towards 200 ppm ammonia and ethanol, respectively, with a response time of 14 s and 20 s after the exposure to ethanol and ammonia and a corresponding recovery time of 26 s and 38 s respectively.

Automated summary

Using the HFCVD technique, vanadium pentoxide (V2O5) thinfilms were deposited and their structural characteristics and gas sensing response were investigated. The thinfilms were found to be orthorhombic V2O5 with preferred orientation. Optimization of oxygen content and substrate to filament distance resulted in the formation of nanorod thinfilms. The nanorod thinfilms showed a sensing response of 1.557 and 1.721 towards 200 ppm ammonia and ethanol, with response and recovery times of 14 s and 26 s for ethanol, and 20 s and 38 s for ammonia, respectively.