An aberration-corrected single layer metasurface with large field of view

With superior capabilities for light manipulation and wavefront shaping, the metasurface facilities the realization of the next generation diffractive optical elements, and thus it has caught growing attention. A key problem, especially in imaging and display fields, is the correction of the aberrations introducing by the incidence with large field of view. Here, we design a focusing metalens working a wavelength of 0.705 mu m by patterning single layer metasurface on one side of a substrate. By adding a correcting phase, the metalens can achieve diffraction-limited focusing along the focal plane with the field of view of 90 degrees and possess an excellent capability of imaging performance. The possibilities of our designed metalens offers unprecedented opportunities for microscopes, lithography machines, sensors, and displays.

Automated summary

We design a focusing metalens working at a wavelength of 0.705μm by patterning single layer metasurface on one side of a substrate. With the addition of a correcting phase, the metalens achieves diffraction-limited focusing along the focal plane with a field of view of 90 degrees and excellent imaging performance. The possibilities of our designed metalens offer unprecedented opportunities for microscopes, lithography machines, sensors, and displays.