The authors propose a method for scalable manufacturing of metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography, which opens a route towards their low-cost, high-throughput mass production. Metalenses are attractive alternatives to conventional bulky refractive lenses due to their superior light-modulating performance and sub-micrometre-scale thicknesses. The existing fabrication techniques have limitations in terms of high cost, low throughput, and small patterning area, which hinder the mass production of metalenses. The authors demonstrate low-cost and high-throughput mass production of large-aperture visible metalenses using the proposed method, resulting in a substantial increase in conversion efficiency.
The authors propose a method for the scalable manufacturing of metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography, opening a route towards their low-cost, high-throughput mass production. Metalenses are attractive alternatives to conventional bulky refractive lenses owing to their superior light-modulating performance and sub-micrometre-scale thicknesses; however, limitations in existing fabrication techniques, including high cost, low throughput and small patterning area, have hindered their mass production. Here we demonstrate low-cost and high-throughput mass production of large-aperture visible metalenses using deep-ultraviolet argon fluoride immersion lithography and wafer-scale nanoimprint lithography. Once a 12 '' master stamp is imprinted, hundreds of centimetre-scale metalenses can be fabricated using a thinly coated high-index film to enhance light confinement, resulting in a substantial increase in conversion efficiency. As a proof of concept, an ultrathin virtual reality device created with the printed metalens demonstrates its potential towards the scalable manufacturing of metaphotonic devices.
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